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Nanolithography

Nanolithography refers to the fabrication of nanometer-scale structures, meaning patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. Nanolithography is used during the fabrication of leading-edge semiconductor integrated circuits or nanoelectromechanical systems (NEMS).

As of 2007, nanolithography is a very active area of research in academia and in industry.

Source:
Wikipedia. Nanolithography


Nanolithography is a process of defining an arbitrary pattern with minimum feature sizes of less than 100 nm.

Source:
BSI. PAS 136:2007. Terminology for nanomaterials


Nanolithography is the art and science of etching, writing, or printing at the microscopic level, where the dimensions of characters are on the order of nanometers. This includes various methods of modifying semiconductor chips at the atomic level for the purpose of fabricating integrated circuits (ICs). Instruments used in nanolithography include the scanning tunnelling microscope (STM) and the atomic force microscope (AFM). Both allow surface viewing in fine detail without necessarily modifying it. Either the STM or the AFM can be used to etch, write, or print on a surface in single-atom dimensions.

Source:
IoN. Glossary of Terms

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